• Skip to Content
  • Skip to Main Navigation
  • Skip to Search

Indiana University Bloomington Indiana University Bloomington IU Bloomington

Open Search
  • Home
  • Search Equipment
  • Search by Academic Unit
  • Contact Us
  • News

Core Research Facilities and Equipment

  • Home
  • Home
  • Search Equipment
  • Search by Academic Unit
  • Contact Us
  • News
  • Search

Focused Ion Beam

Model: Zeiss Auriga 60

Facility: Nanoscale Characterization Facility

Function: The focused ion beam (FIB) instrument is used particularly in the semiconductor and materials science fields for site-specific analysis, deposition, and ablation of materials. The FIB instrument uses a focused beam of ions, e.g., Ga ions, and is incorporated in a system with both electron and ion beam columns, allowing the same feature to be investigated using either or both beams. Source ions are then accelerated to an energy of 5-30 keV (kiloelectronvolts), and focused onto the sample by electrostatic lenses. When the high-energy gallium ions strike the sample, they will sputter atoms from the surface. Because of the sputtering capability, the FIB is used as a micro-machining tool, to modify or machine materials at the micro- and nanoscale. The common smallest beam size is 2.5-6 nm.

Find

  • Contact Information
  • Centers & Institutes

Tools

  • Ilab
  • Pivot
  • UITS Software & Hardware
  • Technology for Researcher

Websites

  • Research @ IU
  • Collections @ IU
  • Research Technologies @ IU

Indiana University

Accessibility | Privacy Notice | Copyright © 2021 The Trustees of Indiana University