Nanoimprint Lithography
Model: Nanonex NX2500
Facility: Nanoscale Characterization Facility
Function: Nanonex NX2500 is a nanoimprint system with front-side alignment for maximum 4” wafer. It has both thermal nanoimprint module and UV nanoimprint module. There two modules could be operated separately or simultaneously. The UV LED light has dual wavelength of ~365 nm and ~395 nm.The non-contact radiant heating and high-efficiency integrated air cooling technologies allow rapid heating and cooling of samples. NX2500 utilizes patented air cushion press (ACP) technique that enables ultimate nanoimprint uniformity. The smart sample holder could handle samples with different sizes (up to 4 inch diameter) and irregular shapes. The high-precision optical alignment module allows sub-micron overlay alignment accuracy.